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Semiconductor Process Control MKS 627C21TGCC1B1 Gauge

627C21TGCC1B1
★★★★☆4.0 (1 review)
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MKS 627C21TGCC1B1

High-accuracy heated vacuum pressure gauge designed for reliable measurements in harsh semiconductor and thin-film process environments

Brand MKS
Model 627C21TGCC1B1
Voltage 24V DC
Country of Origin USA
Weight 0.9 kg
Dimensions 5.4 x 2.3 x 2.3 inches
Warranty 90 days (used product)
Certifications CE, RoHS, UL
SKU / MPN 627C21TGCC1B1
What’s in the box Vacuum pressure gauge unit, calibration certificate, user manual
Measurement Type Heated Capacitance Manometer
Pressure Range 1000 Torr (1333 mbar)
Accuracy 0.5% of Reading
Operating Temperature 0°C to 150°C (heated at 100°C)
Output Signal 0-10V DC analog
Fitting Type 1/2 inch VCR

Key benefits: High-temperature stability, low zero drift, robust heated sensor design, excellent accuracy and repeatability, compact footprint, industry-proven MKS reliability

Typical applications: Semiconductor wafer processing, thin-film deposition, plasma etch chambers, vacuum furnace control, sputtering systems, R&D vacuum systems

Lifecycle: Mature product, long-term support available through MKS service network

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